Following the CNF Annual Meeting, the Kurt J. Lesker Company will host a focused workshop on Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE), highlighting process principles, key techniques, and practical applications in thin film fabrication.

Each hour will feature a distinct session:

• 9:00 AM – Fundamentals of ALD: ALD vs. PVD, process variations, temperature windows, and thin film growth models.

• 10:00 AM – Advanced ALD Concepts: Thermal vs. plasma ALD, pulsing methods, and material characterization.

• 11:00 AM – ALE & System Considerations: Vacuum fundamentals, ALE vs. lithography, pulsing ALE, and downstream process impacts.

Participants are welcome to attend the full workshop or join individual sessions of interest.
Please register in advance to attend.